Work

Investigation of the Tin-Oxo Cluster TOC-21 as a Resist for Electron Beam Lithography

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725602231

Authors: K. G. Nikitin, K. Tsarik, M. Zakharina, K. Arsenyeva

Institutions: National Research University of Electronic Technology, Russian Academy of Sciences, G.A. Razuvaev Institute of Organometallic Chemistry

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140124585

FWCI:

Cites: 3

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