Work

Study of the Influence of Mo–Si Structural Parameters on the Optical Properties of Masking Coatings for Photomasks

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s106373972560133x

Authors: N. V. Krokhan, R. A. Sharipov, A. I. Novoseltsev, O. V. Novikova, V. I. Shevyakov, A. V. Anikin

Institution: National Research University of Electronic Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140132001

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Cites: 3

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