Work

Utilizing Porous Low-k Dielectrics for Self-Monitoring of Vacuum Chamber Contamination

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725601250

Authors: Mungunsuvd Gerelt-Od, F. Y. Konyakhin, A. S. Vishnevskiy, D. V. Lopaev, K. A. Vorotilov, T. V. Rakhimova, M. R. Baklanov

Institutions: MIREA - Russian Technological University, Skobeltsyn Institute of Nuclear Physics, Lomonosov Moscow State University

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140133347

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Cites: 10

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