Work

Comparative Characteristics of Microelectronic Deep Etching Technologies for X-ray Optics Applications

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725601341

Authors: M. N. Sorokovikov, D. A. Zverev, I. I. Lyatun, A. A. Barannikov, M. A. Voevodina, V. A. Yunkin, A. V. Miakonkikh, K. V. Rudenko, A. A. Snigirev

Institutions: Immanuel Kant Baltic Federal University, Russian Academy of Sciences, Kurchatov Institute, Institute of Microelectronics Technology and High Purity Materials

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140140738

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Cites: 18

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