Work

Synthesis and Properties of a Biophenolic End-Capped Polyimide Photoresist with High Film Retention and Sensitivity

Year: 2026

Type: article

Source: ACS Applied Polymer Materials

DOI: 10.1021/acsapm.6c00187

Authors: Changwei Ji, Wei Wei, Xiaojie Li, Jingcheng Liu

Institutions: Jiangnan University, Key Laboratory of Synthetic and Biological Colloids, Ministry of Education

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7141005429

FWCI: 1.766

Cites: 45

Cited by: 1

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