Work

Revealing the Origins of Thermally Induced Anomaly in 18 nm Pitch Ruthenium Nanointerconnects on 300 mm Wafers

Year: 2026

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.6c03315

Authors: Asif A. Shah, Gilles Delie, Petr A. Khomyakov, Jess Wellendorff, Olivier Richard, Seongho Park, Mayank Shrivastava, Hajdin Ceric, Houman Zahedmanesh

Institutions: IMEC, Indian Institute of Science Bangalore, TU Wien

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7143856229

FWCI: 0.993

Cites: 51

Cited by: 1

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