Work

Optimizing photoresist linewidth roughness in ion beam shaping: A systematic study of stage angular configuration

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0005220

Authors: Xiaojian Wu, Shuo Dong, Kaidong Xu, Shiwei Zhuang

Institution: Jiangsu Normal University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Science and Technology of the People's Republic of China, Jiangsu Normal University

OpenAlex ID: W7147320068

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Cites: 28

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