Work

Cryogenic etching device based on the conductive cooling method using liquid nitrogen bath

Year: 2026

Type: article

Source: Review of Scientific Instruments

DOI: 10.1063/5.0305079

Authors: Kil-Byoung Chai, Eun-Beom Choi, Hyo-Chang Lee, Woongsub Song

Institutions: Korea Atomic Energy Research Institute, Korea University of Science and Technology, Korea Aerospace University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, Ministry of Science and ICT, South Korea

Awards: G6000825995, G7322201936, G7973659507

OpenAlex ID: W7147533411

FWCI:

Cites: 16

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