Improving the sputtered titanium film for the NIK ceramic chamber in TPS
Year: 2026
Type: conference-paper
Abstract: The development of the Nonlinear In-vacuum Kicker (NIK) is one of the key projects of the Taiwan Photon Source (TPS). Efficient conduction of the image current generated by the stored beam requires the deposition of a highly conductive titanium thin film on the inner surface of the NIK ceramic chamber. Based on tests involving the sputtering of a 5.5 μm titanium film onto a 34 cm × 6 cm ceramic substrate, the uniformity of the titanium film was controlled within 5%. The adhesion strength between the titanium film and the ceramic substrate reached 60 MPa, and the electrical resistivity was measured at 7.2 × 10⁻⁵ Ω·cm. This paper presents a detailed overview of the coating system, experimental methodology, and test results.
Source: JACOW
Language: English
Subfield: Aerospace Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
OpenAlex ID: W7148514327
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