Work

Extreme-Pressure Imprint-Directed Micropatterning of Self-Assembled Nanostructures

Year: 2026

Type: article

Source: ACS Applied Nano Materials

DOI: 10.1021/acsanm.6c00269

Authors: Yu Na Kim, Eun Bin Kang, Yu Jin Kang, Junghoon Lee, Seung Sae Hong, Sung-Dae Kim, Diana Jeong, Min Sun Lee, Woon Ik Park

Institutions: Pukyong National University, Stanford University, Daegu Gyeongbuk Institute of Science and Technology

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Awards: G5646165541, G6553783594, G889155147

OpenAlex ID: W7148592091

FWCI:

Cites: 46

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