Work

Enhancement of etch rate and selectivity for tungsten carbide hardmask

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0005300

Authors: Wan Soo Song, Beom Seok Kim, Aram Kim, Sang Jeen Hong

Institutions: Myongji University, Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Korea Evaluation Institute of Industrial Technology

Award: G7283542360

OpenAlex ID: W7148718960

FWCI:

Cites: 27

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