Work

High-resolution chemical patterns from negative-tone resists for directed self-assembly: extension to EUV lithography and Al2O3 sacrificial patterns

Year: 2026

Type: conference-paper

Source: SPIE Novel Patterning Technologies

DOI: 10.1117/12.3082402

Authors: Kyunghyeon Lee, Ki Hyun Kim, Emma Vargo, Honggu Im, Warren Holcomb, Bruno La Fontaine, Ricardo Ruiz, Paul F. Nealey

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7151866556

FWCI:

Cites: 8

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Related to: 10