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Spectral Measurement and Calculation of Internal Pressure in Laser‐Induced Silicon Oxide Thin‐Film Plasma

Year: 2026

Type: article

Source: Annalen der Physik

DOI: 10.1002/andp.202500601

Authors: Guixia Wang, Qingsong Wang

Institution: Xi'an Technological University

Language: English

Topic: Laser-induced spectroscopy and plasma

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G4728159585

OpenAlex ID: W7153481410

FWCI:

Cites: 6

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