Mitigating Lithography Stitching Losses Using Topological Photonic Crystals in Silicon Photonics
Year: 2026
Type: article
Source: Laser & Photonics Review
DOI: 10.1002/lpor.71182
Authors: Ce Chen, Chunxue Wang, Pan Hu, Lu Sun, Yikai Su, Xingchen Ji
Institution: Shanghai Jiao Tong University
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7153807607