Work

Advancing EUV Patterning: Innovations in Resist Platforms, Patterning Strategies, and Computational Approaches

Year: 2026

Type: review

Source: Chemical Reviews

DOI: 10.1021/acs.chemrev.5c01043

Authors: Madan Rajendra Biradar, Gokhan Sagdic, Chenyun Yuan, Rika Marui, Christopher Kemper Ober

Institution: Cornell University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Cornell University, SK Hynix, Energy Frontier Research Centers

OpenAlex ID: W7154305978

FWCI: 2.739

Cites: 334

Cited by: 6

Related to: