Work

Dynamic electrical response and discharge mode transitions in CF4/Ar capacitively coupled plasmas with automatic matching networks

Year: 2026

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/5.0323169

Authors: Pan Zhao, Shimin Yu, Yu Wang, Jingwen Xu, Hongyu Wang, Wei Jiang, Ya Zhang

Institutions: Wuhan University of Technology, Huazhong University of Science and Technology, Ruhr University Bochum, Anshan Normal University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G1303391166, G3658540377, G7778691778

OpenAlex ID: W7154498006

FWCI:

Cites: 46

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