Work

Three-dimensional absorber correction for EUV mask defect compensation

Year: 2026

Type: article

Abstract: Extreme ultraviolet multilayer defects induce both amplitude and phase effects, which significantly degrade defocused imaging quality. However, existing phase effects compensation approaches either require alteration of the multilayer structure, introduce additional phase-shifting materials, or impose constraints on pattern pitch. In this work, we propose a defect compensation method based on three-dimensional absorber correction that avoids all of these limitations and achieves substantially improved defocused imaging performance compared with existing techniques. Within this framework, the trade-off between three-dimensional and two-dimensional corrections is explored, while a multi-channel perception strategy is employed to enhance imaging performance. Simulation results demonstrate that the proposed method effectively compensates for defects of various types, sizes, and locations under both 0.33 NA and 0.55 NA conditions, and applies to diverse mask patterns.

Source: Optics Express

DOI: 10.1364/oe.587781

Authors: Hanzhi Zhang, Sikun Li, Xiaowei Song, Jingquan Lin

Institutions: Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, University of Chinese Academy of Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

Funders: National Natural Science Foundation of China, Department of Science and Technology of Jilin Province