Aberration-balanced initial structure design of extreme ultraviolet lithography objective systems via hybrid optimization
Year: 2026
Type: article
Source: Applied Optics
DOI: 10.1364/ao.589602
Authors: Mingqi Ai, Songmao Xian, Shiyu Li, Zeyu Huang, Song Hu, Junbo Liu, Ji Zhou
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7154996933