Work

Catalyst-free growth of graphene on Si substrate using reactive pulsed sputtering

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005380

Authors: Yuto Oishi, Akihiro Iwata, Masanori Shinohara, Fumihiko Maeda, Takashi Matsumoto

Institutions: Fukuoka University, Fukuoka Institute of Technology, Tokyo Electron Technology Solutions Limited (Japan)

Language: English

Topic: Graphene research and applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: Fukuoka University, Japan Society for the Promotion of Science

Awards: Deposition of carbon films due to decomposition of source molecules during pulse plasmas and elucidation of its reactions, G5620298514

OpenAlex ID: W7160661801

FWCI:

Cites: 31

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