Fundamentals of Chemical Vapor Deposition (CVD) and Atomic Layer Deposition (ALD) and Safety Management of Chemical Substances Part 2 : Fundamentals of Chemical Reaction Kinetics
Year: 2026
Type: article
Abstract: In order to discuss chemical vapor deposition (CVD) and atomic layer deposition (ALD), it is necessary to understand chemical reactions. Part 3 of this course will explain actual reaction analysis and process control technologies for CVD and ALD. In this, Part 2, the basics of chemical reactions were explained for application to CVD and ALD.
Source: Vacuum and Surface Science
DOI: 10.1380/vss.69.275
Author: Atsushi SEKIGUCHI
Institution: Kogakuin University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: diamond
OpenAlex ID: W7160720384