Work

Effect of Ti buffer layer on stress and time evolution characteristics of boron carbide thin films

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005452

Authors: Peibo Duan, Jiaoling Zhao, Ge Zhang, Yanyan Yuan

Institutions: Jiangsu University of Science and Technology, Chinese Academy of Sciences, Shanghai Institute of Optics and Fine Mechanics, University of Chinese Academy of Sciences

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G6644243894

OpenAlex ID: W7160840554

FWCI:

Cites: 30

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