Work

Thick, low doped (001) gallium oxide drift layers at 100 mm via halide vapor phase epitaxy

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005421

Authors: Caroline E. Reilly, Heather Splawn, Jacob H. Leach

Institution: Kyma Technologies (United States)

Language: English

Topic: Ga2O3 and related materials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: U.S. Air Force

Award: G8480400241

OpenAlex ID: W7161580249

FWCI: 3.084

Cites: 17

Cited by: 3

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