Highly photoactive Cu2O films with enhanced crystallinity for PEC water splitting
Year: 2026
Type: article
Abstract: This study explores the deposition of single-phase Cu2O films using magnetron sputtering techniques, with a focus on comparing Direct Current Magnetron Sputtering (DCMS) and High-Power Impulse Magnetron Sputtering (HiPIMS). The HiPIMS technique demonstrated several advantages over DCMS, including more straightforward deposition, improved crystallinity, and higher photocurrent density, jph, during linear sweep voltammetry measurements. As a result, films prepared by HiPIMS became the focus of further optimization. The effects of key deposition parameters – such as substrate temperature, oxygen partial pressure, film thickness, and post-deposition annealing – on the structural and photoelectrochemical properties of Cu2O films were systematically investigated. The optimized films exhibited a fully densified microstructure, high crystallinity, and enhanced jph values. The highest jph of −3 mA/cm2 at 0.03 V vs. RHE was achieved for a 5-µm thick film deposited at an oxygen partial pressure of 0.42 Pa and a substrate temperature of 500 °C, followed by post-annealing at 600 °C in a vacuum. This represents the highest jph value reported to date for a bare Cu2O photocathodes. These results highlight the potential of HiPIMS-deposited Cu2O films for efficient photoelectrochemical water splitting.
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $4,340
Award: G3490003685
OpenAlex ID: W7162211635
