Work

Etching of CoFeB nanometer thin films using inductively coupled plasma reactive ion etching

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0005457

Authors: Chen Yang, Yu Yu, Zuowei Shi, Yuzhong Yang, Yu Gao, Ruixin Li, Yiwen Li, Shujun Ye, Koichi Nishioka

Institution: Beijing Institute of Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Fundamental Research Funds for the Central Universities

OpenAlex ID: W7162754635

FWCI:

Cites: 49

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