Work

Investigating the Effect of Chamber Wall Pre-Coating and Substrate on the HK-MG Dummy Polysilicon Removing Process

Year: 2026

Type: conference-paper

Source: China Semiconductor Technology International Conference (CSTIC)

DOI: 10.1109/cstic68613.2026.11537621

Authors: Fanglin Huo, Minxiang Wang, Yang Chen, Yuping Ren

Institution: Advanced Micro-Fabrication Equipment (China)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7163129511

FWCI:

Cites: 6

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Related to: 10