Work

Noninvasive method for monitoring plasma parameters and dielectric thickness applicable to plasma processing

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005528

Authors: Beom-Jun Seo, Jiwon Jung, Jae-Hoon Choi, Se-Hun Ahn, Nayeon Kim, Chin-Wook Chung

Institution: Hanyang University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, National Research Foundation of Korea, Korea Semiconductor Research Consortium

Awards: G2531033225, G254945888, G3168497709, G4087693449, G6006938687, G626722953, G6355037862, G6821527106, G7902031766, G8858223699

OpenAlex ID: W7164892397

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Cites: 27

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