Work

Preparation and field emission properties of Al-CNx thin films co-deposited by pulsed cathodic arc and magnetron sputtering methods

Year: 2026

Type: article

Source: Materials Science in Semiconductor Processing

DOI: 10.1016/j.mssp.2026.110909

Authors: Xinxin Du, Bing Zhou, Haowei Du, D.G. Piliptsou, Zhubo Liu

Institutions: Taiyuan University of Technology, Francisk Skorina Gomel State University

Language: English

Topic: Metal and Thin Film Mechanics

Subfield: Mechanics of Materials

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

OpenAlex ID: W7165381840

FWCI:

Cites: 38

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Related to: 10