Work

Defect annihilation in block copolymer nanopatterning through solvent immersion annealing

Year: 2026

Type: article

Source: Nanoscale

DOI: 10.1039/d6nr01356b

Authors: Min Seong Kim, Seokyoung Bae, Sang Hyun Choi, So Youn Kim

Institution: Seoul National University

Language: English

Topic: Block Copolymer Self-Assembly

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Research Foundation of Korea, Samsung

Awards: G1463757920, G3209404465

OpenAlex ID: W7167075540

FWCI:

Cites: 33

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Related to: 10