Low temperature sensitivity of femtosecond-laser induced amorphization of silicon
Year: 2026
Type: preprint
Source: SSRN Electronic Journal
DOI: 10.2139/ssrn.7113801
Authors: Andong Wang, Gonzalo Gomez-Munoz, Mario Garcia-Lechuga, Pol Sopeña, Emmanuel André, Jose Gonzalo, Sicheng Zhu, Jan Siegel, David Grojo
Language: English
Subfield: Industrial and Manufacturing Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W7168179889