Work

All-optical erasing of photorefractive solitonic X-Junctions in lithium niobate thin-film on insulator

Year: 2026

Type: article

Abstract: We report the in-situ erasing of solitonic channels in lithium niobate thin films on insulator (LNOI). The experiments are performed in 8 μm thick films of congruent undoped LiNbO3 to partially or totally erase X-junction structures. The erasing procedure is based on the local application of a strong photovoltaic field that removes the localized photoexcited charge density redistributing it over the whole crystal.

Source: Optics Communications

DOI: 10.1016/j.optcom.2026.133605

Authors: Alessandro Bile, Mathieu Chauvet, Eugenio Fazio

Institutions: Sapienza University of Rome, Centre National de la Recherche Scientifique, Franche-Comté Électronique Mécanique Thermique et Optique - Sciences et Technologies, Université de Franche-Comté

Language: English

Topic: Photorefractive and Nonlinear Optics

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: hybrid

Estimated APC paid: $2,600

Funders: European Commission, Sapienza Università di Roma