Work

Pressure-dependent accumulation and ion conversion in hydrogen plasma driven by repetitive pulsed EUV irradiation

Year: 2026

Type: article

Source: Journal of Applied Physics

DOI: 10.1063/5.0345819

Authors: Li Liu, Xingpeng Wang, Jingwen Xu, Zili Chen, Yu Wang, Zhipeng Chen, Wei Jiang, Ya Zhang

Institutions: Wuhan University of Technology, Huazhong University of Science and Technology, Ruhr University Bochum

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G1303391166, G3658540377

OpenAlex ID: W7203636345

FWCI:

Cites: 36

Cited by:

Related to: