Work

Highly Efficient Postprocessing Cleaning of van der Waals Devices

Year: 2026

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.6c02887

Authors: Zhaokuan Yu, Yuqing He, Juntai Wu, Xin Lu, Quanshui Zheng, Ming Ma

Institutions: Tsinghua Shenzhen International Graduate School, Tsinghua University, Zhejiang University, Research Institute of Tsinghua University in Shenzhen

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, China Postdoctoral Science Foundation, Science, Technology and Innovation Commission of Shenzhen Municipality, National Key Research and Development Program of China

Awards: G1322081199, G4836961401, G4889778714, G5392451613, G7983808294

OpenAlex ID: W7203711173

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Cites: 43

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