Submicron microdevice patterning with plasma-thinned nail-polish microfiber shadow masks
Year: 2026
Type: article
Abstract: . The method requires no photolithography, minimizes material cost, and leverages readily available tools and consumables, providing a practical route to prototyping and education as well as laboratory microfabrication.
Source: Nanoscale Advances
DOI: 10.1039/d6na00537c
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $1,962
Funders: Ministerio de Ciencia, Innovación y Universidades, Ministerio de Ciencia e Innovación, European Research Council, Agencia Estatal de Investigación, Fundamental Research Funds for the Central Universities, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, European Social Fund
Awards: G1175115578, G1301230144, G1374727592, G1401168639, G1855990336, G2262748287, G2309174360, G252646220, G2550080368, G2560614322, G2643395488, G2660406951, G2933350706, G294895050, G300979063, G346319554, G3471339378, G3480869486, G3518538256, G3552419949, G425668148, G430777504, G4313052969, G464105488, G4721796101, G5080475149, G5178125280, G5338730000, G5421974903, G5755570853, G5805502524, G5901262501, G594019444, G6218905885, G6836654024, G7084143925, G711120973, G7127239378, G745419941, G7842427394, G7890126743, G8375075789, G8575141037, G8888022036, G99296377
OpenAlex ID: W7204115220