Photopatterning Block Copolymer Enables Mechanical Enhancement
Year: 2026
Type: article
DOI: 10.1002/anie.3898240
Institution: Peking University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Awards: G7009903318, G7040503733, G8471726208
OpenAlex ID: W7204137851
