Atomic layer etching brings ‘cutting-edge’ method to semiconductor nanofabrication
Year: 2026
Type: article
Source: Scilight
DOI: 10.1063/10.0046481
Author: Ben Ikenson
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7204166044
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