Defect engineering in Czochralski silicon through tin-doping: A perspective from tin-vacancy-oxygen interactions
Year: 2026
Type: article
Source: Journal of Applied Physics
DOI: 10.1063/5.0344234
Institution: Zhejiang University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G287522004
OpenAlex ID: W7204196835
