Work

Effects of H2 addition on highly selective SiOCN etching using NF3-based plasma

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005595

Authors: Takahiro Goya, Masanaga Fukasawa, Akiko Hirata, Wataru Mizubayashi, Yoshihiro Hayashi

Institution: National Institute of Advanced Industrial Science and Technology

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: New Energy and Industrial Technology Development Organization

Award: G3633360255

OpenAlex ID: W7204443902

FWCI:

Cites: 47

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