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Integrating area-selective catalytic PMMA etching with PMMA-inhibited area-selective deposition of HfO2

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005630

Authors: Enzo Novoselic, Natalya Tokranova, Christophe Vallée

Institution: University at Albany, State University of New York

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Tokyo Electron

OpenAlex ID: W7204864915

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Cites: 37

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