Work

Application and prospect of electron beam lithography technology

Year: 2026

Type: article

Source: Chinese Journal of Semiconductors

DOI: 10.3724/cjos.2025.045

Authors: Ruibo ZHAO, Kangzhi HAN, Ruohan LI, Yanzhe ZHAO, Xuefeng SONG, Zhensheng ZHANG, Dapeng YU

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7212879059

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Cites: 90

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