Versatile Sleeve-and-Bulk Fabrication of Inversely Designed Nanophotonic Structures with High Pattern Transfer Fidelity
Year: 2026
Type: preprint
Abstract: Inverse design is a powerful computational tool for generating nanophotonic devices that should outperform their traditionally designed counterparts. However, translating these theoretical gains into physical devices is challenging because the irregular and non-intuitive features that make inversely designed structures so effective also make them exceptionally difficult to fabricate, typically necessitating substantial process optimization unique to each device design. We describe a versatile two-step nanofabrication process that achieves pattern transfer fidelity in excess of 90% for each of three distinct inverse device designs with no device-specific process optimization.
Source: arXiv (Cornell University)
Institution: University of Delaware
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W7213328550