Meta-Nanomanufacturing Framework via UROA and STCT: Elevating Lithography, ALD/ALE, and Metrology Beyond Classical Limits
Year: 2026
Type: preprint
Abstract: This paper super-elevates the fundamental physical limitations faced by nanomanufacturing and metrology equipment—specifically Rayleigh diffraction limits [1], stochastic ALD defects [2], and quantum state deformation induced by measurement [3]—through Universal Rough Operator Algebra (UROA) and the Seonggil Theory of Composite Torsion (STCT). By rigorously subsuming top-down (EUV) and bottom-up (DSA, ALD) processes into a Lagrangian extremum problem within an 8-Dimensional topological tensor space, this framework mathematically suppresses cumulative fabrication errors and spectacularlyelevates destructive metrology into the continuous measurement of symplectic topological invariants.
Author: Lee, Seonggil
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W7219667169
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