Work

Gradient-based inverse design of phase-shifting transmission masks for EUV interference lithography

Year: 2026

Type: article

Source: Optics Express

DOI: 10.1364/oe.612975

Authors: Lukas Dolfen, Lars Lohmann, Sascha Brose, Paul Buske, Annika Bonhoff, Carlo Holly

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

OpenAlex ID: W7222985069

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