Work

A Fast and Accurate Source-Mask Optimization Flow Using a Unified Abbe-Hopkins Framework

Year: 2026

Type: article

Source: Optics Express

DOI: 10.1364/oe.616234

Authors: Ying Wang, Ming Zeng, Kaiye Liu, Yang Zhang, Shuting Cai, David Wei

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

OpenAlex ID: W7223655872

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