Work

High- k Gate Dielectrics for Organic Field-Effect Transistors: Interfacial Engineering, Performance Optimization, and Scalable Flexible Electronics

Year: 2026

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.6c14631

Authors: Yu Wang, Xi Li, Tianyu Yu, Fei Cheng, Ruotong Jin, Xianlian Lin, Xia Li, Heqing Ye, Zhenguo Liu

Institutions: Henan University, Northwestern Polytechnical University, Luoyang Ship Material Research Institute

Language: English

Topic: Organic Electronics and Photovoltaics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Natural Science Foundation of Henan Province, Science and Technology Department of Zhejiang Province

OpenAlex ID: W7223684978

FWCI:

Cites: 185

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Related to: 10