Work

Enhancing Nano-Structure Stability in Sublimation Drying: Practical Insights into Solidified Film Morphology

Year: 2026

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/p-m5tnul

Authors: Y. Hanawa, A. Horikoshi, A. Onuma, S. Tokisue, J. Zhang, M. Xu, M. Mohit, Y. Sasaki, K. Sawada, J. Yoshida, A.P. Sasmito, A. Sakuma

Institutions: SCREEN (Japan), McGill University, Kyoto Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7224156780

FWCI:

Cites: 13

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Related to: 10