Work

Selective Alkaline Wet Etching of Al and AlCu Using a Phosphoric and Nitric Acid Free Formulation

Year: 2026

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/p-gagd5d

Authors: Rogelio J. Gomez-Pineiro, Zouhir Mehrez, Virginie Loup, Philippe Garnier, Marine Audouin, Jérôme Daviot

Institutions: Commissariat à l'Énergie Atomique et aux Énergies Alternatives, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7224171893

FWCI:

Cites: 16

Cited by:

Related to: 10