Work

Fabrication Process for Direct Femtosecond Laser Writing of Phase Masks in Polydimethylsiloxane

Year: 2026

Type: preprint

Abstract: Femtosecond direct laser writing of phase masks presents a highly versatile and simplified prototyping alternative to conventional lithography. In this work, we demonstrate a process capable of inducing controlled localized phase shifts up to 2π inside bulk polydimethylsiloxane (PDMS), a flexible and biocompatible substrate, using femtosecond pulses at 515 nm by varying line density and number of layers. We validated the process by fabricating several masks such as a cylindrical Fresnel lens, a Dammann diffraction grating, and a Fourier computer-generated hologram.

DOI: 10.1364/opticaopen.34842351.v1

Authors: Thomas Sicotte, Ahmed Al Makki, Jean-Sébastien Boisvert, Lucien Weiss, Sébastien Loranger

Institution: Polytechnique Montréal

Language: English

Topic: Laser Material Processing Techniques

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: Polytechnique Montréal, Canada First Research Excellence Fund, Fonds de Recherche du Québec - Santé, Fonds de recherche du Québec – Nature et technologies

Award: G5852916227

OpenAlex ID: W7224255791

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