Work

In Situ Monitoring for Wet Rinse Process Using Electrochemical Impedance Spectroscopy on Sensing Wafers

Year: 2026

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/p-c17zwi

Authors: Mai Nagase, Kensuke Shinohara, Takahiro Yamaguchi

Institutions: SCREEN Semiconductor Solutions Co., Ltd. (Japan), SCREEN (Japan)

Language: English

Topic: Corrosion Behavior and Inhibition

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

SDG: Responsible consumption and production

Open Access status: closed

OpenAlex ID: W7224292089

FWCI:

Cites: 7

Cited by:

Related to: 10