Work

Unique pH Effects on TiN Etching in Nano Confinement with Dilute H2O2 Solutions

Year: 2026

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/p-66rvsj

Authors: Dai Ueda, Akiko Harumoto

Institution: SCREEN (Japan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7224558630

FWCI:

Cites: 8

Cited by:

Related to: 10