Work

Advanced PFAS-Free Surface Modifying Treatment (SMT) and Sublimation Drying Agents for Pattern Collapse Prevention

Year: 2026

Type: article

Source: Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena

DOI: 10.4028/p-h27jir

Authors: Kazuki Yoshiura, Mizuki Tetsumura, Daisuke Saruwatari, Shuhei Yamada, Soichi Kumon, Farid Sebaai, Xiu Mei Xu

Institutions: Central Glass (Japan), IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7224667314

FWCI:

Cites: 9

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Related to: 10